Wikipedia: History of Chemical Vapor Deposition

Difference (from prior major revision) (minor diff)

Changed: 7c7

*Metal-Organic CVD (MOCVD) - CVD processes based on metal-organic precursors, such as Tantalum Ethoxide, Ta(OC₂H₅)₅,to create TaO? , Terta Dimethyl amino Titanium (or TDMAT) to create TiN?.

*Metal-Organic CVD (MOCVD) - CVD processes based on metal-organic precursors, such as Tantalum Ethoxide, Ta(OC₂H₅)₅,to create Ta₂O₅ , Tetra Dimethyl amino Titanium (or TDMAT) to create TiN?.

	Revision 4 . . (edit) August 18, 2001 10:42 am by Stokerm [Terta -> Tetra]
	Revision 2 . . (edit) August 17, 2001 2:58 am by Mike Dill [wikify]